TEM/AFM study of the growth of La2−xSrxCuO4 thin films laser deposited on (100) SrTiO3 substrates
✍ Scribed by M.-J. Casanove; A. Alimoussa; M. Schwerdtfeger; S. Gaubert; H. Moriceau; J.-C. Villegier
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 700 KB
- Volume
- 33
- Category
- Article
- ISSN
- 0921-5107
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✦ Synopsis
The growth characteristics of La 2_xsr~cuO4 thin films of various thicknesses (10-150 nm), epitaxially grown by laser ablation on (100) SrTiO 3 substrates, were analysed by transmission electron microscopy (TEM) and atomic force microscopy (AFM). A periodic surface roughness with an important peak-valley amplitude (about 20% of the film thickness) was clearly observed in the films thicker than 25 nm. The period of the undulations did not depend on the deposited thickness. In contrast, AFM experiments performed on thinner films showed a perfect smoothness of the surface and a complete coverage of the substrate. These results were examined in connection with the fabrication of YBCO/LSCO (YBa2Cu3OT_a/La 2_ ~SrrCuO4) high T c superconducting multilayer films.
📜 SIMILAR VOLUMES
In this study, SrAl 2 O 4 :Eu 2 + ,Dy 3 + thin film phosphors were deposited on Si (1 0 0) substrates using the pulsed laser deposition (PLD) technique. The films were deposited at different substrate temperatures in the range of 40-700 1C. The structure, morphology and topography of the films were