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TEM Investigation of the annealing behaviour of Ne+-implanted silicon

✍ Scribed by Nabert, G. ;Habermeier, H.-U.

Publisher: John Wiley and Sons
Year: 1991
Tongue: English
Weight: 317 KB
Volume: 123
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.2211230221

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