This textbook, originally published in 1987, broadly examines the software required to design electronic circuitry, including integrated circuits. Topics include synthesis and analysis tools, graphics and user interface, memory representation, and more. The book also describes a real system called
Technology computer aided design : simulation for VLSI MOSFET
β Scribed by Chandan Kumar Sarkar
- Publisher
- CRC Press Taylor & Francis Group
- Tongue
- English
- Leaves
- 445
- Category
- Library
No coin nor oath required. For personal study only.
β¦ Synopsis
Responding to recent developments and a growing VLSI circuit manufacturing market, Technology Computer Aided Design: Simulation for VLSI MOSFET examines advanced MOSFET processes and devices through TCAD numerical simulations. The book provides a balanced summary of TCAD and MOSFET basic concepts, equations, physics, and new technologies related to TCAD and MOSFET. A firm grasp of these concepts allows for the design of better models, thus streamlining the design process, saving time and money. This book places emphasis on the importance of modeling and simulations of VLSI MOS transistors and TCAD software. Providing background concepts involved in the TCAD simulation of MOSFET devices, it presents concepts in a simplified manner, frequently using comparisons to everyday-life experiences. The book then explains concepts in depth, with required mathematics and program code. This book also details the classical semiconductor physics for understanding the principle of operations for VLSI MOS transistors, illustrates recent developments in the area of MOSFET and other electronic devices, and analyzes the evolution of the role of modeling and simulation of MOSFET. It also provides exposure to the two most commercially popular TCAD simulation tools Silvaco and Sentaurus. β’ Emphasizes the need for TCAD simulation to be included within VLSI design flow for nano-scale integrated circuits β’ Introduces the advantages of TCAD simulations for device and process technology characterization β’ Presents the fundamental physics and mathematics incorporated in the TCAD tools β’ Includes popular commercial TCAD simulation tools (Silvaco and Sentaurus) β’ Provides characterization of performances of VLSI MOSFETs through TCAD tools β’ Offers familiarization to compact modeling for VLSI circuit simulation R&D cost and time for electronic product development is drastically reduced by taking advantage of TCAD tools, making it indispensable for modern VLSI device technologies. They provide a means to characterize the MOS transistors and improve the VLSI circuit simulation procedure. The comprehensive information and systematic approach to design, characterization, fabrication, and computation of VLSI MOS transistor through TCAD tools presented in this book provides a thorough foundation for the development of models that simplify the design verification process and make it cost effective.
β¦ Table of Contents
Content: Machine generated contents note: 1.Introduction to Technology Computer Aided Design / Samar K. Saha --
2.Basic Semiconductor and Metal-Oxide-Semiconductor (MOS) Physics / Swapnadip De --
3.Review of Numerical Methods for Technology Computer Aided Design (TCAD) / Kalyan Koley --
4.Device Simulation Using ISE-TCAD / N. Mohankumar --
5.Device Simulation Using Silvaco ATLAS Tool / Angsuman Sarkar --
6.Study of Deep Sub-Micron VLSI MOSFETs through TCAD / Srabanti Pandit --
7.MOSFET Characterization for VLSI Circuit Simulation / Soumya Pandit --
8.Process Simulation of a MOSFET Using TSUPREM-4 and Medici / Atanu Kundu.
Abstract: ''MOSFET and related high-speed semiconductor devices are spearheading the drive toward smaller, faster, and lower-power electronics. This work concentrates on technology computer aided design (TCAD) and its integration into the IC fabrication process flow. It presents modeling techniques and concepts involved with the TCAD simulation of MOSFET devices. The book describes basic concepts and background related to popular commercial TCAD software as well as recent technologies to improve device performance such as multiple gate MOSFET, FINFET, SOI devices, and high-k gate material devices''
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