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Tantalum film deposited by asymmetric a-c sputtering : F. Vratny and D. J. Harrington, J. Electrochem. Soc., 112, No. 5, May (1966), p. 484


Book ID
103273032
Publisher
Elsevier Science
Year
1967
Tongue
English
Weight
93 KB
Volume
6
Category
Article
ISSN
0026-2714

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