T-DYN Monte Carlo simulations applied to ion assisted thin film processes

Three-dimensional Monte Carlo simulation

Three-dimensional Monte Carlo simulation of sputtered atom transport in the process of ion-plasma sputter deposition of multicomponent thin films

✍ P.K. Petrov; V.A. Volpyas; R.A. Chakalov 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 197 KB

An algorithm for Monte Carlo simulation of sputtered atom transport during ion-plasma sputtering was developed. The experimentally determined initial energy distribution of sputtered atoms, the influence of the background gas mixture and the real equipment geometry of the magnetron sputtering system