Semi-insulating GaAs made by As implanta
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A. Claverie; F. Namavar; Z. Liliental-Weber; P. Dreszer; E.R. Weber
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Article
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1993
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Elsevier Science
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English
⚖ 529 KB
We have demonstrated that it is possible to regrow amorphous layers created by high dose As implantation in GaAs by thermal annealing in order to obtain arsenic precipitates distributed in a GaAs matrix similarly to that observed in low temperature GaAs. The characteristics of the As precipitates ca