Synthesis of CoSi2-structures using ion microprobes
✍ Scribed by J Meijer; U Weidenmüller; P Baving; H Röcken; A Stephan; H.H Bukow; C Rolfs
- Book ID
- 114171719
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 323 KB
- Volume
- 161-163
- Category
- Article
- ISSN
- 0168-583X
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
A mass separated focused ion beam (FIB) is a very useful tool to fabricate nanostructures by writing implantation within an ion beam synthesis process. In these investigations the IMSA-OrsayPhysics FIB, equipped with a Co 36 Nd 64 alloy liquid metal ion source, was applied. Si(100) and ( 111) wafers
CoSi layers were produced by 70 keV Co focused ion implantation into Si(111). Within a comparative study the CoSi 2 2 layer quality and implantation damage were investigated as a function of pixel dwell-time and substrate temperature. Irradiation damage measurements were done by micro-Raman analysis