𝔖 Bobbio Scriptorium

✦ LIBER ✦

Synthesis of a new manufacturable high-quality graded gate oxide for sub-0.2 μm technologies

✍ Scribed by Roy, P.K.; Yuanning Chen; Chetlur, S.

Book ID: 114538826
Publisher: IEEE
Year: 2001
Tongue: English
Weight: 150 KB
Volume: 48
Category: Article
ISSN: 0018-9383
DOI: 10.1109/16.944191

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE IEEE 1998 International Interconne

[IEEE IEEE 1998 International Interconnect Technology Conference - San Francisco, CA, USA (1-3 June 1998)] Proceedings of the IEEE 1998 International Interconnect Technology Conference (Cat. No.98EX102) - A manufacturable embedded fluorinated SiO/sub 2/ for advanced 0.25 μm CMOS VLSI multilevel interconnect applications

✍ Pai, C.S.; Velaga, A.N.; Lindenberger, W.S.; Lai, W.Y.-C.; Cheung, K.P.; Baumann 📂 Article 📅 1998 🏛 IEEE ⚖ 546 KB

[IEEE 2002 IEEE Bipolar/BICMOS Circuits

[IEEE 2002 IEEE Bipolar/BICMOS Circuits and Technology Meeting - Minneapolis, MN, USA (29 Sept.-1 Oct. 2002)] Proceedings of the Bipolar/BiCMOS Circuits and Technology Meeting - QUBiC4G: a f/sub T//f/sub max/ = 70/100 GHz 0.25 μm low power SiGe-BiCMOS production technology with high quality passives for 12.5 Gb/s optical networking and emerging wireless applications up to 20 GHz

✍ Deixler, P.; Colclaser, R.; Bower, D.; Bell, N.; De Boer, W.; Szmyd, D.; Bardy, 📂 Article 📅 2002 🏛 IEEE ⚖ 421 KB