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Synthesis and lithographic characterization of poly[(dihydrocarveol)-co-(1,1-dimethylethyl bicyclo[2.2.1]hept-5-ene-2-carboxylate)-co-(maleic anhydride)]

โœ Scribed by Hwang, Seok-Ho; Jung, Jae-Chang


Publisher
John Wiley and Sons
Year
1999
Tongue
English
Weight
130 KB
Volume
48
Category
Article
ISSN
0959-8103

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โœฆ Synopsis


A new ArF single-layer resist polymer, poly(dihydrocarveol-co-1,1-dimethylethyl bicyclo[2.2.1]hept-5-ene-2-carboxylate-co-maleic anhydride) has been synthesized by radical polymerization. The molar composition of synthesized resist polymer was conยฎrmed by elemental analysis. The obtained molar composition was 0.25:0.35:0.40. This resist polymer was found to be stable up to 230 ยฐC, but above 250 ยฐC it underwent rapid thermal deprotection of the tert-butyl groups by releasing carbon dioxide and 2-methylpropene. The deprotection temperature was established by DSC and TGA. Using the resist, 0.14 mm L/S pattern was obtained at 26 mJ/cm ร€2 doses, using an ArF stepper and the developer of 2.38 wt% tetramethyl ammonium hydroxide aqueous solution.


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