Synthesis and characterization of Ti-Si-C-N films
β Scribed by D. V. Shtansky; E. A. Levashov; A. N. Sheveiko; J. J. Moore
- Publisher
- The Minerals, Metals & Materials Society
- Year
- 1999
- Tongue
- English
- Weight
- 680 KB
- Volume
- 30
- Category
- Article
- ISSN
- 1073-5623
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We presented both laser synthesis and characterization of ultrafine nanometric (12 to 20 nm diameter) Si/C/N powders starting from NH 3 , SiH 4 and C 2 H 2 gas mixture, using a continuous-wave CO 2 laser. The main parameters affecting this process are: the reactant flow ratio R F NH3 =F SiH4 , the C
By using tetraethylortosilicate, titanium and zirconium tetrabutoxide, and aluminum sec-butoxide, as well as neutral 1,10 and 1,12 alkyldiamines or dodecyltrimethylammonium bromide as precursors, a series of six oxides, Si+Al, Si+Ti, Si+Zr, Al+Zr, Al+Ti, and Al+Ti+Zr, were obtained. These materials