Synthesis and characterization of poly(ether amide ether ketone)/poly(ether ketone ketone) copolymers

✍ Scribed by Bin Huang; Meihua Zhu; Mingzhong Cai

• Publisher: John Wiley and Sons
• Year: 2010
• Tongue: English
• Weight: 189 KB
• Volume: 119
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/app.32723

✦ Synopsis

Abstract

A new monomer, __N,N′‐__bis(4‐phenoxybenzoyl)‐m‐phenylenediamine (BPPD), was prepared by condensation of m‐phenylenediamine with 4‐phenoxybenzoyl chloride in N,N‐dimethylacetamide (DMAc). A series of novel poly(ether amide ether ketone) (PEAEK)/poly(ether ketone ketone) (PEKK) copolymers were synthesized by the electrophilic Friedel‐Crafts solution copolycondensation of terephthaloyl chloride (TPC) with a mixture of diphenyl ether (DPE) and BPPD, over a wide range of DPE/BPPD molar ratios, in the presence of anhydrous AlCl~3~ and N‐methylpyrrolidone (NMP) in 1,2‐dichloroethane (DCE). The influence of reaction conditions on the preparation of copolymers was examined. The copolymers obtained were characterized by different physicochemical techniques. The copolymers with 10–25 mol % BPPD were semicrystalline and had remarkably increased __T~g~__s over commercially available PEEK and PEKK due to the incorporation of amide linkages in the main chains. The copolymers III and IV with 20–25 mol % BPPD had not only high __T~g~__s of 184–188°C, but also moderate __T~m~__s of 323–344°C, having good potential for the melt processing. The copolymers III and IV had tensile strengths of 103.7–105.3 MPa, Young's moduli of 3.04–3.11 GPa, and elongations at break of 8–9% and exhibited outstanding thermal stability and good resistance to organic solvents. © 2010 Wiley Periodicals, Inc. J Appl Polym Sci, 2011