Synthesis and characterization of photosensitive polysiloxane

✍ Scribed by F. Sun; S.L. Jiang

• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 440 KB
• Volume: 254
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2006.10.067

✦ Synopsis

UV-curable polydimethylsiloxane epoxy acrylate (PESA) was synthesized by reacting epoxy polydimethylsiloxane with acrylic acid (AA). It is shown that the optimum synthesis temperature for PESA is 100-110 °C and triethylamine is best one among those catalysts tested. The structure of the oligomer was characterized by FT-IR, 1 H-NMR, GPC and UV spectra. The photosensitive properties of assynthesized PESA were investigated using IR and gel yield method. It is noted that the PESA system shows a notable photosensitivity, which is 27.8 mJ/cm 2 . PESA cured film exhibited a tensile strength of 6.34 MPa, hardness of 1-2 H, water absorption of 1.45% and decomposition temperature of 402.2 °C. The as-synthesized PESA resin may find great application in UV-curing optical fiber, metal and glass coating and solder mask materials for printed circuit.