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Synthesis and characterization of a photosensitive polyimide precursor and its photocuring behavior for lithography applications

✍ Scribed by Le Thu T. Nguyen; Huu Nieu Nguyen; Thai Ha T. La


Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
382 KB
Volume
29
Category
Article
ISSN
0925-3467

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