Synchrotron Radiation-Excited Chemical Vapor Deposition of Silicon Nitride Films from a SiH[sub 4] + NH[sub 3] Gas Mixture

✍ Scribed by Kyuragi, Hakaru

• Book ID: 126605276
• Publisher: The Electrochemical Society
• Year: 1991
• Tongue: English
• Weight: 603 KB
• Volume: 138
• Category: Article
• ISSN: 0013-4651
• DOI: 10.1149/1.2085424