This study reports on transmission electron microscopy investigations of higher manganese silicide (HMS) layers grown by molecular beam epitaxy (MBE) on (001)Si using the surfactant mediated reactive deposition technique. Applying Sb as a surfactant (surface active substances) results in an increase
Surfactant-mediated growth of TiSi2 on Si(001)
β Scribed by H Hortenbach; M Falke; S Teichert; G Beddies; H.-J Hinneberg
- Publisher
- Elsevier Science
- Year
- 2002
- Tongue
- English
- Weight
- 384 KB
- Volume
- 64
- Category
- Article
- ISSN
- 0167-9317
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β¦ Synopsis
We report on the growth of thin titanium silicide layers on Si(001) by surfactant-mediated reactive deposition (SMRD) at temperatures in the range of 300-800 8C. The surface diffusion of Ti and Si is crucial for the morphology of the growing silicide layer and can be altered by the presence of a surfactant (here Sb). Samples prepared with and without Sb were analysed by SEM, RBS, TEM and XRD. The results show that the phase of the growing silicide is not influenced by the surfactant. For temperatures higher than 400 8C, the C49-disilicide phase was found. The SEM investigations show that the pinhole density in the TiSi layer is significantly 2 reduced by the surfactant.
π SIMILAR VOLUMES
The effects of stress on the formation of C54Β±TiSi 2 phase in Ti/(001)Si samples have been investigated by high-resolution transmission electron microscopy in conjunction with auto-correlation function (ACF) analysis. The C54Β±TiSi 2 phase transformation temperature in tensily stressed samples was fo