Surface Wave Plasma Abatement of CHF 3 and CF 4 Containing Semiconductor Process Emissions

✍ Scribed by Wofford, Bill A.; Jackson, Marc W.; Hartz, Chris; Bevan, John W.

• Book ID: 126193084
• Publisher: American Chemical Society
• Year: 1999
• Tongue: English
• Weight: 85 KB
• Volume: 33
• Category: Article
• ISSN: 0013-936X
• DOI: 10.1021/es9805472