In situ etch treatments of silicon carbi
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Angelis, S. De ;Perrone, D. ;Scaltrito, L. ;Ferrero, S. ;Pirri, C. F. ;Mauceri,
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Article
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2006
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John Wiley and Sons
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English
β 135 KB
## Abstract Different homo epitaxial 4HβSiC commercial wafers were undergone hydrogen etching process that was developed in the reaction chamber of a Hot Wall Chemical Vapor Deposition (HWCVD) reactor. We have studied the effects of physical desorption to point out the morphology and the structural