Surface orientation as a control parameter for the growth of non-stoichiometric gallium arsenide

✍ Scribed by T. Marek; C. Schür; S. Kunsági-Máté

• Publisher: John Wiley and Sons
• Year: 2005
• Tongue: English
• Weight: 548 KB
• Volume: 202
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200521265

✦ Synopsis

Abstract

In order to study the effect of the substrate orientation on the incorporation of excess arsenic into low temperature grown gallium arsenide, we examine molecular beam epitaxial layers grown at constant low substrate temperatures and constant III/V flux ratio on exactly (001) oriented substrates and on vicinal substrates tilted up to 10° towards the 〈111〉A and 〈111〉B directions. Our experiments show that the substrate orientation has a significant influence on the excess arsenic content and thus needs to be considered as an additional parameter to control low temperature growth of gallium arsenide. Respective ab‐initio calculations offer first models for the incorporation of excess arsenic into As antisite and As interstitial positions on misoriented as well as exactly oriented substrates. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)