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Surface Chemistry of Planarized SiLK-Films Studied by XPS

✍ Scribed by Heeg, Jan ;Schubert, Ulf ;K�chenmeister, Frank

Publisher
Springer-Verlag
Year
2000
Weight
137 KB
Volume
133
Category
Article
ISSN
0344-838X

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Effect of RCA cleaning on the surface ch
Effect of RCA cleaning on the surface chemistry of glass and polysilicon films as studied by ToF-SIMS and XPS
✍ Onyiriuka, E. C.; Moore, C. B.; Fehlner, F. P.; Binkowski, N. J.; Salamida, D.; 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 232 KB 👁 2 views

The surface chemistry of an alkaline-earth boroaluminosilicate glass is changed by contact with chemical solutions. The present study shows that RCA cleaning creates a silica-rich surface on the glass. This altered surface can be removed by hydroÑuoric acid etching. During the RCA cleaning process,