Atmospheric pressure chemical vapor deposition (APCVD) of TiO 2 thin films has been achieved onto glass and onto ITO-coated glass substrates, from the reaction of TiCl 4 with ethyl acetate (EtOAc). The effect of the synthesis temperature on the optical, structural and electrochemical properties was
β¦ LIBER β¦
Surface chemistry and optical property of TiO2 thin films treated by low-pressure plasma
β Scribed by Marshal Dhayal; Jin Jun; Hal Bon Gu; Kyung Hee Park
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 455 KB
- Volume
- 180
- Category
- Article
- ISSN
- 0022-4596
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