๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Surface and bulk diffusion of adsorbed nickel on ultrathin thermally grown silicon dioxide

โœ Scribed by J.T. Mayer; R.F. Lin; E. Garfunkel


Book ID
118365119
Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
1015 KB
Volume
265
Category
Article
ISSN
0039-6028

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Characterization of ultrathin ON stacked
โœ A.J. Bauer; E.P. Burte; H. Ryssel ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 687 KB

In this study, a stable process for fabrication of dielectric dual layers consisting of a low pressure thermal oxide layer and a deposited nitride layer for gate dielectric applications was established. The ON (oxide nitride) dual layers were compared to silicon oxide layers up to 5 nm thickness the