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Suppression of oxidation-enhanced boron diffusion in silicon by carbon implantation and characterization of MOSFETs with carbon-implanted channels

โœ Scribed by Ban, I.; Ozturk, M.C.; Demirlioglu, E.K.


Book ID
114536955
Publisher
IEEE
Year
1997
Tongue
English
Weight
205 KB
Volume
44
Category
Article
ISSN
0018-9383

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