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Supply of hydrogen radicals generated by microwave plasma to the SiN film growing surface during RF plasma enhanced chemical vapor deposition

✍ Scribed by Kanji Yasui; Kazuhiro Shimizu; Hisashi Takahashi; Tadashi Akahane

Book ID: 103617015
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 446 KB
Volume: 65-66
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(93)90669-3

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