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Supplemental Proceedings (Materials Properties, Characterization, and Modeling) || The Post-Annealing Effects of N-Doped ZnO Films Deposited by the Atomic Layer Deposition

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Book ID
120422461
Publisher
John Wiley & Sons, Inc.
Year
2012
Weight
473 KB
Category
Article
ISBN
1118296095

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N-doped p-type ZnO films were grown by plasma-free metal-organic chemical vapor deposition (MOCVD). The effect of substrate temperature on the electrical, optical, and structural properties of the N-doped ZnO films was investigated by Hall-effect, photoluminescence, X-ray diffraction measurements. T