Structural and electrical properties of
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I VΓ‘vra; P Lobotka; J DΓ©rer; L.R. Wellenberg
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Article
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1998
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Elsevier Science
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English
β 412 KB
We have found the deposition technology at which the interface roughness of Nb/Si multi/a yer is strongly correlated and decreases with deposited layer number. On the basis of our Nb/Si multilayer we succeeded to prepare ten-fold stacked Josephson junction (JJ). Basic electric properties of stacked