๐”– Bobbio Scriptorium
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Superconducting and electrical properties of rhenium nitride and amorphous rhenium prepared by ion implantation

โœ Scribed by A. Haq; O. Meyer


Publisher
Springer US
Year
1983
Tongue
English
Weight
503 KB
Volume
50
Category
Article
ISSN
0022-2291

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Recent advances in high dose ion implantation The surface properties such as depth profile, techniques have produced silicon-on-insulator chemical bond and structure, and electrical prop-(SOI) substrates for the fabrication of electronic erties of oxide and nitride layers in aluminium devices. Oxyge