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Super silicon: Top semiconductor turns into a superconductor

✍ Scribed by Peter Weiss

Book ID
115062902
Publisher
Society for Science & the Public
Year
2006
Tongue
English
Weight
468 KB
Volume
170
Category
Article
ISSN
0036-8423

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50 MeV boron ions have been implanted into silicon wafers homogeneously with doses between 5 x 10 II and 2 x 1014 cm :. Prior to the implantation the wafers have been processed in an integrated-circuit line to generate the early structures of the desired device. After the irradiation, processing of