Substrate temperature-induced changeover from homogeneous to step nucleated growth modes for the initial thermal oxidation of Si(001) by O2

✍ Scribed by L Kubler; F Lutz; J.L Bischoff; D Bolmont

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 397 KB
• Volume: 41
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(90)93887-o