7310. Substrate temperature-induced changeover from homogeneous to step nucleated growth modes for the initial thermal oxidation of Si(001) by O2: L Kubler et al, Vacuum, 41, 1124–1127

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 146 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)91117-7