Substrate Temperature Dependence of the Photoresist Removal Rate Using Atomic Hydrogen Generated by a Hot-Wire Tungsten Catalyst

✍ Scribed by Yamamoto, Masashi; Maruoka, Takeshi; Kono, Akihiko; Horibe, Hideo; Umemoto, Hironobu

• Book ID: 120472483
• Publisher: Institute of Pure and Applied Physics
• Year: 2010
• Tongue: English
• Weight: 227 KB
• Volume: 49
• Category: Article
• ISSN: 0021-4922
• DOI: 10.1143/JJAP.49.016701