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Substrate Symmetry Driven Endotaxial Silver Nanostructures by Chemical Vapor Deposition

✍ Scribed by Juluri, R. R.; Rath, A.; Ghosh, A.; Satyam, P. V.


Book ID
120442520
Publisher
American Chemical Society
Year
2013
Tongue
English
Weight
270 KB
Volume
117
Category
Article
ISSN
1932-7447

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In this work, we have studied the influence of the substrate surface condition on the roughness and the structure of the nanostructured DLC films deposited by High Density Plasma Chemical Vapor Deposition. Four methods were used to modify the silicon wafers surface before starting the deposition pro