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Substrate-induced anisotropy of c-axis textured NaxCoO2 thin films

โœ Scribed by L. Yu; Y. Krockenberger; Ingo Fritsch; H.-U. Habermeier


Book ID
116847838
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
889 KB
Volume
35
Category
Article
ISSN
0079-6786

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Highly oriented AlN films are successfully deposited on B + implanted Si(1 1 1) substrates in a radio frequency inductively coupled plasma (RF/ICP) system. The implanted energy and dose used for the B + implanted Si(1 1 1) substrates are 200 keV and 10 15 cm ร€2 , respectively. The c-axis texture of