Substrate bias effects in plasma immersion ion implantation assisted deposition from a TiAl cathodic arc

✍ Scribed by S Mukherjee; H Reuther; F Prokert; E Richter; W Moeller

• Book ID: 108423108
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 132 KB
• Volume: 160
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/s0257-8972(02)00376-6