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Sub-microns period grating couplers fabricated by silicon mold

โœ Scribed by Yigui Li; Di Chen; Chunsheng Yang


Book ID
104159657
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
286 KB
Volume
33
Category
Article
ISSN
0030-3992

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โœฆ Synopsis


This paper describes a novel simple process suitable for fabrication of micro-periodic structure in optical waveguide. The mold was fabricated using electron beam lithography and fast atom beam etching. Sub-micron-scale patterns were transferred from silicon mold to polymer layer. Grating coupler was fabricated by the mold and normal optical mask. In the proposed method, no press which is needed for imprint lithography is required and the mold structure can be duplicated with high aspect ratio. Experimental coupling e ciency is about 25%. This technique can also be used to fabricate other nanometer-scale structures.


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โœ L.A. Wang; C.H. Lin; J.H. Chen ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 790 KB

Sub-quarter-micron grating patterns with period as fine as 0.22 p.m have been obtained by combining DUV holographic lithography and silylation technique for the first time. A traditional chemical amplified resist (JSR KRF/K2G) originally working for single layer process at 248 nm wavelength was used