Study on organosilicon positive resist. III. Organosilicon positive excimer laser resist (OSPR-2016)
β Scribed by Hisashi Sugiyama; Akiko Mizushima; Kazuo Nate
- Publisher
- John Wiley and Sons
- Year
- 1992
- Tongue
- English
- Weight
- 298 KB
- Volume
- 44
- Category
- Article
- ISSN
- 0021-8995
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
## Abstract Silsesquioxane, siloxane, and silmethylene polymers with phenolic hydroxy groups were prepared in order to obtain alkaliβsoluble organosilicon polymers. These polymers have structures in which the phenol moieties are separated by one carbon from the silicon. The hydroxy groups were prot
While attrition from sharp bony surfaces is the most common cause of extensor digiti minimi (EDM) tendon rupture, the etiology of other cases of spontaneous EDM tendon rupture is still unknown. Friction within the compartment may play a role, especially with ulna dislocation. The purpose of this stu