Study on organosilicon positive resist. II. Organosilicon positive photoresist (OSPR–1334) and its application to bilayer resist system

✍ Scribed by Hisashi Sugiyama; Akiko Mizushima; Takashi Inoue; Kazuo Nate

• Publisher: John Wiley and Sons
• Year: 1992
• Tongue: English
• Weight: 594 KB
• Volume: 44
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/app.1992.070440910