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Study of the chemical bonding of titanium with silicon and oxygen by AES and SEELS

โœ Scribed by J.K.N. Sharma; B.R. Chakbraorty; S.M. Shivaprasad

Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
750 KB
Volume
50
Category
Article
ISSN
0368-2048

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XPS and x-ray-induced AES have been used to study the reaction layers formed on silicon powder samples heated in ultra-high purity nitrogen at temperatures between 1100 and 1200 "C. An equation was derived to calculate the average surface reaction layer thicknesses from the silicon AES spectra. The