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Study of interdiffusion in amorphous Si/Ge multilayers by Rutherford backscattering spectrometry

✍ Scribed by A. Simon; A. Csik; F. Pászti; Á.Z. Kiss; D.L. Beke; L. Daróczi; Z. Erdélyi; G.A. Langer

No coin nor oath required. For personal study only.

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