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Study of CoCr films deposited by magnetron sputtering under different nitrogen partial pressures

✍ Scribed by Z.F. Zhou; Y.D. Fan

Book ID
107864447
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
745 KB
Volume
239
Category
Article
ISSN
0040-6090

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Titanium oxynitride (TiN x O y ) films have been deposited onto polyethylene terephthalate (PET) substrates by reactive radio frequency (RF) magnetron sputtering. The influence of the nitrogen (N 2 ) partial pressure in the discharge atmosphere, with a set pressure of 0.133 Pa, was examined. Other d