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Studies of the sputter deposition of carbon, silicon and SiC films

✍ Scribed by A. Sathyamoorthy; W. Weisweiler


Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
530 KB
Volume
87
Category
Article
ISSN
0040-6090

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Triode technology in the sputter deposit
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A d.c. triode sputtering gun has been used to produce thin carbon films by sputtering from a graphite target in argon at two different powers. The films were produced on glass, aluminum foil, and single crystal sodium chloride substrates. The films were studied by X-ray photoelectron spectroscopy, A