Atomic Layer Deposition of Gadolinium Ox
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K. Kukli; T. Hatanpää; M. Ritala; M. Leskelä
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Article
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2007
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John Wiley and Sons
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English
⚖ 320 KB
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Thin cubic Gd 2 O 3 films are grown by atomic layer deposition (ALD), in the temperature range 300-400 °C, using a novel tris(2,3-dimethyl-2-butoxy)gadolinium(III) precursor, Gd[OC(CH 3 ) 2 CH(CH 3 ) 2 ] 3 , and water. The films are crystalline in their as-deposited state. The films contain some res