Studies of epoxy resin systems: Part A: A study of the origins of the secondary relaxations of epoxy resins by thermally stimulated depolarization
β Scribed by T. D. Chang; S. H. Carr; J. O. Brittain
- Publisher
- Society for Plastic Engineers
- Year
- 1982
- Tongue
- English
- Weight
- 636 KB
- Volume
- 22
- Category
- Article
- ISSN
- 0032-3888
No coin nor oath required. For personal study only.
β¦ Synopsis
Abstract
The relaxation behavior of several epoxy resin systems, which have systematic structural differences, has been studied by the thermally stimulated discharge (TSD) technique. Two TSD peaks centered at about 115Β°K (Ξ² peak) and 185Β°K (Ξ² peak) were found for epoxy resins cured with a diamine. Structural change, either in the epoxy resin molecule or the amine molecule, did not seem to affect those two peaks. The TSD thermogram of the DGEBA (diglycidyl ether of disphenol A) epoxy resin part only showed a small new peak at 160Β°K instead of the ft peak at 185Β°K. This result, together with the fact that postcuring increased Ξ² peak height, leads to the conclusion that the ft peak is most likely due to the newlyβcreated molecular segment during the curing reaction. The peak at 160Β°K was assigned to the epoxy group. This assignment was based on the fact that the 160Β°K peak of an epoxy homopolymer, which has fewer epoxy groups, was smaller than that of the parent DGEBA. The Ξ² and Ξ³ peaks were found to be of distributed characteristics, and the distribution of activation energy was studied by the partial heating method.
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