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Structure of thin films of titanium nitride

โœ Scribed by V. Valvoda


Book ID
119178097
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
359 KB
Volume
219
Category
Article
ISSN
0925-8388

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Titanium nitride films, as used for hard coatings, were deposited on silicon wafers by reactive unbalanced magnetron sputtering. For thinner films we find a higher compressive average residual stress than for thicker films. In the paper it is shown that this reduction in average stress is not due to