Investigation of the positive resist dissolution process under low-energy e-bemn exposure has given rise to a new technology of 3D structure fonnation. This technology has a higher process latitude, which is of great hnportance for commercial prt~uction, and is cheap and e,xsy. Multilayer technologi
โฆ LIBER โฆ
Structure formation in atom lithography using geometric collimation
โ Scribed by T. Meijer; J. P. Beardmore; C. G. C. H. M. Fabrie; J. P. van Lieshout; R. P. M. J. W. Notermans; R. T. Sang; E. J. D. Vredenbregt; K. A. H. van Leeuwen
- Book ID
- 106030293
- Publisher
- Springer
- Year
- 2011
- Tongue
- English
- Weight
- 804 KB
- Volume
- 105
- Category
- Article
- ISSN
- 0721-7269
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