In this paper, composite fluorocarbon/ZnO films were prepared by R.F. sputtering used polytetrafluoroethylene (PTFE) and Zn target on polyethylene terephthalate (PET) substrate. Argon was used as the working gas and oxygen used as reacting gas. The obtained films were characterized by means of SEM,
Structure and washing fastness of composite fluorocarbon/ZnO films prepared by RF sputtering
โ Scribed by Yuhui Zhang; Quan Ji; Rongzhan Liu; Zengji Liu; Hongjin Qi
- Book ID
- 104094570
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 478 KB
- Volume
- 203
- Category
- Article
- ISSN
- 0257-8972
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โฆ Synopsis
Composite fluorocarbon/ZnO films were deposited by RF sputtering, using polytetrafluoroethylene and Zn targets, on polyethylene terephthalate substrates. Argon and oxygen were used as working and reacting gases, respectively, with an oxygen:argon volume ratio of 3:1. The films were characterized by X-ray Photoelectron Spectroscopy, Fourier Transform Infrared Spectroscopy and static contact angle measurements. It was found that the deposited films are made up of the four components -CF 3 , -CF 2 -, -CFand -C-. The proportions of the four components varied with sputtering conditions. There was a large number of C=C double bonds on the surface of deposited films. The static contact angle of the deposited films was greater than 90ยฐ, indicating excellent hydrophobicity. The contact angle of films decreased after washing, and the washing fastness of the composite films were slightly inferior to those of the fluorocarbon films.
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