Structure and properties of TiCx layers prepared by plasma-assisted chemical vapour deposition methods

✍ Scribed by Ch. Täschner; A. Leonhardt; M. Schönherr; E. Wolf; J. Henke

• Book ID: 103951591
• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 433 KB
• Volume: 139
• Category: Article
• ISSN: 0921-5093
• DOI: 10.1016/0921-5093(91)90598-h

✦ Synopsis

The preparation of hard coatings on hard metal substrates (WC/Co) using a d.c.-plasma glow discharge method is described. The TiC, coatings were deposited from the gas phase with starting gases TiCI4, hydrogen, argon and a carbon source (benzene or n-heptane). The deposition temperature was chosen as 950 K. The film deposition rate was in the range 10-30/~m h-~. The coatings obtained were smooth and of small grain size (10-30 nm). Interface interactions between the layer and the substrate were not observed. The structures of the TiC, coatings were analysed by electron microscopy and X-ray diffraction. The measured Vickers microhardness passes through a maximum, dependent on the gas phase composition. No change in structure and texture was observed by variation of the carbon source (benzene or n-heptane).