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Structure and Properties of LPCVD Silicon Films

✍ Scribed by Kamins, T. I.


Book ID
124086588
Publisher
The Electrochemical Society
Year
1980
Tongue
English
Weight
670 KB
Volume
127
Category
Article
ISSN
0013-4651

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## Abstract The influence of nitrogen on the internal structure and so on the electrical properties of silicon thin films obtained by low‐pressure chemical vapor deposition (LPCVD) was studied using several investigation methods. We found by using Raman spectroscopy and SEM observations that a stro