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Structure and chemical composition of glow discharge Si:H,Cl films. The role of gas phase argon addition.

✍ Scribed by Giovanni Bruno; Pio Capezzuto; Grazia Cicala; Francesco Cramarossa

Book ID
118333502
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
146 KB
Volume
77-78
Category
Article
ISSN
0022-3093

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