๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Structural properties of a-Si:H related to ion energy distributions in VHF silane deposition plasmas

โœ Scribed by E.A.G Hamers; W.G.J.H.M van Sark; J Bezemer; H Meiling; W.F van der Weg


Book ID
117149156
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
255 KB
Volume
226
Category
Article
ISSN
0022-3093

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Effect of ion energy on structural and e
โœ Ram, Sanjay K. ;Kroely, Laurent ;Bulkin, Pavel ;Cabarrocas, Pere Roca i ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 483 KB

## Abstract Microcrystalline silicon films were deposited in a matrix distributed electron cyclotron resonance (MDECR) plasma enhanced chemical vapor deposition (PECVD) system using pure silane, under varying substrate bias conditions. Microstructural characterization of the films shows a lower voi