Structural, optical, and electrical properties of n-ZnO/p-GaAs heterojunction
✍ Scribed by Tekmen, Süleyman ;Gür, Emre ;Asıl, Hatice ;Çınar, Kübra ;Coşkun, Cevdet ;Tüzemen, Sebahattin
- Publisher
- John Wiley and Sons
- Year
- 2010
- Tongue
- English
- Weight
- 285 KB
- Volume
- 207
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
Abstract
n‐ZnO film grown by electrodeposition (ECD) on p‐GaAs substrate was characterized by structural, optical, and electrical techniques. X‐ray diffraction (XRD) measurement clearly showed formation of ZnO thin film with a strong c‐axis (0002) preferential orientation. Photoluminescence (PL) measurements showed that the grown film has a strong and narrow ultraviolet (UV) emission indicating high‐quality ZnO thin film. Current–voltage (I–V) measurement of n‐ZnO/p‐GaAs heterojunction shows diode‐like rectifying characteristics with an almost five‐order rectification factor and a turn‐on voltage of 2 V.
📜 SIMILAR VOLUMES
ZnO films were grown on Si(100) and quartz substrates by inductively coupled plasma assisted chemical vapor deposition (ICP-CVD), using metal organic DEZ (diethlyzinc), and a gas mixture of Ar and O 2 . The process temperature ranged between room temperature and 400 °C. ZnO films showed both p-and n